ディテール
数量（個）:1
最小注文数量:1
リードタイム:3~6 months
配送方法:陆运, 海运
製品ディテール
Overview:
1. Process application: RTP RTO RTA RTN RTN
2. Wafer size: 8 inches and below
3. Applicable substrate material: Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
4. Temperature range: 200~1300°C
2. Wafer size: 8 inches and below
3. Applicable substrate material: Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
4. Temperature range: 200~1300°C