ディテール
数量（個）:1
最小注文数量:1
リードタイム:1~3 weeks
配送方法:快递, 空运, 陆运, 海运
製品ディテール
Overview:
It is applied in the HT and deposition machine as the process gas channel. It's the critical component in the HT and deposition process
Advantages:
1.Adopt integrated drilling process
2.Realize customized processing of any length.(3-14mm aperture)
3.High purity of raw materials.
4. High metal contamination control to meet the requirements of the silicon wafer treatment process
5.Same coefficient of the thermal expansion