ディテール
数量（個）:1
最小注文数量:1
リードタイム:3~6 months
配送方法:陆运, 海运
規格番号:LKQXJ100
製品ディテール
Overview:
1. Process application: Degumming, low-temperature degumming, priming film, decarburization film, plasma cleaning
2. Wafer size: 8 inches and below
3. Applicable substrate material: Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
4. Capacity: WPH 150
2. Wafer size: 8 inches and below
3. Applicable substrate material: Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
4. Capacity: WPH 150