ディテール
数量（個）:1
最小注文数量:1
リードタイム:3~6 months
配送方法:陆运, 海运
製品ディテール
Overview:
Alignment measurement of overlay in semiconductor production
Advantages:
1. High sensitivity: high performance imaging system with high NA and low aberration are adopted.
2. Process adaptability: Wide spectrum light source and polarization can be added, which has good process adaptability for FinFET process.
3. Superior CoO: Ultra-precision high-speed motion platformare coupledwith high performance measurement method.
4. User-friendly: Automatic measurement mode selection and automatic prescription generation are available, so that prescription generation time ca n greatly saved.
5. Factory automation: It supportsSECS/GEM SEMI standard, which can fully meet the requirements of factory automation.
2. Process adaptability: Wide spectrum light source and polarization can be added, which has good process adaptability for FinFET process.
3. Superior CoO: Ultra-precision high-speed motion platformare coupledwith high performance measurement method.
4. User-friendly: Automatic measurement mode selection and automatic prescription generation are available, so that prescription generation time ca n greatly saved.
5. Factory automation: It supportsSECS/GEM SEMI standard, which can fully meet the requirements of factory automation.