Необходимые детали
Количество (штук):1
MOQ:1
Время выполнения заказа:3~6 months
Доставка:陆运, 海运
номер спецификации:LKQXJ100
Введение в продукт
Overview:
1. Process application: Degumming, low-temperature degumming, priming film, decarburization film, plasma cleaning
2. Wafer size: 8 inches and below
3. Applicable substrate material: Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
4. Capacity: WPH 150
2. Wafer size: 8 inches and below
3. Applicable substrate material: Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
4. Capacity: WPH 150
