Essential details
Quantity(pieces):1
MOQ:1
Lead time:1~3 weeks
Shipping:Express delivery, air transportation, land transportation, sea transportation
Product Introduction
Overview:
This alumina slurry is designed to meet the specification requirements for silicon carbide and sapphire substrate production polishing. It is specifically formulated for both batch and single-wafer CMP systems. The advanced composition delivers ultra-high removal rates while maintaining exceptional surface planarity, zero sub-surface damage, and low defects with minimal scratching.