تفاصيل أساسية
العدد (قطعة):1
الحد الأدنى للكمية المطلوبة:1
وقت التسليم:1~3 weeks
طريقة الشحن:快递, 空运, 陆运, 海运
وصف المنتج
Overview:
It is applied in the HT and deposition machine as the process gas channel. It's the critical component in the HT and deposition process
Advantages:
1.Adopt integrated drilling process
2.Realize customized processing of any length.(3-14mm aperture)
3.High purity of raw materials.
4. High metal contamination control to meet the requirements of the silicon wafer treatment process
5.Same coefficient of the thermal expansion